PECVD System
Vim li cas thiaj xaiv peb?
Txhim khu khoom zoo
Xinkyo Company tau tsim nyob rau hauv 2005 los ntawm cov kws tshawb fawb cov ntaub ntawv. Nws tus tsim tau kawm hauv Peking University thiab yog lub chaw tsim khoom ntawm cov cuab yeej siv ntsuas kub siab thiab cov ntaub ntawv tshiab tshawb fawb cov cuab yeej kuaj. Qhov no ua rau peb muab cov khoom siv zoo, tsis tshua muaj nqi siab rau cov ntaub ntawv tshawb fawb thiab kev tsim kho cov chaw soj nstuam.
Khoom siv Advanced
Cov khoom siv tseem ceeb: CNC xuas nrig ntaus tshuab, CNC dabtsi yog khoov tshuab, CNC engraving tshuab, kub kub qhov cub CNC lathes, dag tshuab, gantry milling, machining chaw, ntawv hlau, laser txiav machine, CNC xuas nrig ntaus tshuab, dabtsi yog khoov machine, tus kheej capacitive vuam tshuab , argon arc vuam tshuab, laser vuam, sandblasting tshuab, tsis siv neeg xim ci chav.
Kev siv dav dav
Cov khoom siv tsuas yog siv hauv ceramics, hmoov metallurgy, 3D luam ntawv, kev tshawb fawb thiab kev loj hlob ntawm cov ntaub ntawv tshiab, cov ntaub ntawv siv lead ua, kev kho cua sov hlau, iav, cov ntaub ntawv tsis zoo electrode rau lub zog tshiab lithium roj teeb, cov khoom sib nqus, thiab lwm yam.
Kev lag luam dav
XinKyo Furnace cov nyiaj tau los ntawm kev muag khoom txhua xyoo yog ntau tshaj 50 lab, nrog rau North American kev lag luam (xws li Tebchaws Meskas, Canada, Mexico, thiab lwm yam) suav txog 30% thiab European lag luam (xws li Fabkis, Spain, Lub Tebchaws Yelemees, thiab lwm yam) suav nrog. txog 20%; 15% nyob rau sab hnub tuaj Asia (Nyiv, Kaus Lim Kauslim, Thaib, Malaysia, Singapore, Is Nrias teb, thiab lwm yam) thiab 10% hauv kev lag luam Lavxias; 10% hauv Middle East (Saudi Arabia, UAE, ect ), 5% hauv Australian lag luam, thiab 10% ntxiv.
PECVD System yog dab tsi?
Plasma Enhanced Chemical Vapor Deposition (PECVD) systems feem ntau yog siv nyob rau hauv kev lag luam semiconductor rau nyias zaj duab xis deposition txheej txheem. PECVD thev naus laus zis suav nrog kev tso cov khoom siv rau hauv lub substrate los ntawm kev qhia cov pa roj carbon monoxide rau hauv ib puag ncig plasma. PECVD cov tshuab muab ntau yam zoo, suav nrog kev ua haujlwm kub qis, kev ua yeeb yaj kiab zoo ib yam, siab tso nyiaj ntau, thiab sib haum nrog ntau yam khoom siv. Cov tshuab no tau siv dav hauv ntau daim ntawv thov xws li microelectronics, photovoltaics, optics, thiab MEMS (micro-electromechanical systems).
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![1200C Peb Lub Cuab Yeej Cuab Yeej PECVD System]()
1200C Peb Lub Cuab Yeej Cuab Yeej PECVD SystemSK2-CVD-12TPB4 yog lub raj rauv rau PECVD qhov system, muaj 300W lossis 500W RF fais fab mov, ntau lub channel precision flow system, lub tshuab nqus tsev, thiab lub raj rauv. Qhov feem ntau siv...Ntau
Qhov zoo ntawm PECVD System
Tsawg deposition kub
PECVD system tuaj yeem ua tau ntawm qhov ntsuas kub qis dua li ntawm chav tsev kub txog 350 degree, piv rau tus qauv CVD kub ntawm 600 degree txog 800 degree. Qhov ntsuas kub qis dua no tso cai rau cov ntawv thov ua tiav qhov siab dua CVD tuaj yeem ua rau lub cuab yeej puas lossis substrate raug coated.
Zoo conformity thiab cov kauj ruam npog
PECVD system muab kev sib raug zoo thiab kev pab cuam ntawm cov chaw tsis sib xws. Qhov no txhais tau hais tias cov yeeb yaj kiab nyias tuaj yeem muab tso rau hauv qhov sib npaug thiab sib npaug ntawm qhov nyuaj thiab tsis sib xws, ua kom cov txheej txheem zoo txawm tias nyob rau hauv cov geometries nyuaj.
Txo kev ntxhov siab ntawm cov txheej txheem nyias nyias
Los ntawm kev ua haujlwm ntawm qhov kub thiab txias, PECVD system txo qhov kev ntxhov siab ntawm cov txheej txheem nyias nyias uas yuav muaj qhov sib txawv thermal expansion lossis contraction coefficients. Qhov no yuav pab kom muaj kev ua tau zoo ntawm cov hluav taws xob zoo thiab kev sib txuas ntawm cov txheej txheem.
Tighter tswj ntawm nyias zaj duab xis txheej txheem
PECVD tso cai rau kev tswj xyuas qhov tseeb ntawm cov tshuaj tiv thaiv, xws li cov pa roj ntws, plasma zog, thiab siab. Qhov no enables fine-tuning ntawm cov txheej txheem deposition, ua rau cov yeeb yaj kiab zoo nrog cov khoom xav tau.
Siab deposition nqi
PECVD system tuaj yeem ua tiav qhov kev tso nyiaj siab, tso cai rau cov txheej txheem ua haujlwm tau zoo thiab ceev ceev. Qhov no tshwj xeeb tshaj yog muaj txiaj ntsig zoo rau cov ntawv thov kev lag luam uas xav tau cov nqi tsim khoom sai.
Cleaner zog rau kev ua kom
PECVD txheej txheem txheej txheem siv plasma los tsim lub zog xav tau rau txheej txheej txheej txheej, tshem tawm qhov xav tau ntawm thermal zog. Qhov no tsis tsuas yog txo cov kev siv hluav taws xob xwb tab sis kuj ua rau kev siv lub zog huv dua.
Kev siv PECVD System
PECVD system yog txawv ntawm cov pa CVD (cov tshuaj vapor deposition) nyob rau hauv uas nws siv plasma rau deposit txheej rau ib tug nto ntawm qis kub. Cov txheej txheem CVD vam khom rau ntawm qhov chaw kub kom muaj kev cuam tshuam cov tshuaj mus rau hauv lossis ib ncig ntawm lub substrate, thaum PECVD siv cov plasma diffuse txheej rau saum npoo.
Muaj ntau yam txiaj ntsig ntawm kev siv PECVD txheej. Ib qho ntawm qhov zoo tshaj plaws yog lub peev xwm los tso cov txheej txheem ntawm qhov kub thiab txias, uas txo cov kev ntxhov siab ntawm cov khoom siv coated. Qhov no tso cai rau kev tswj tau zoo dua ntawm cov txheej txheem txheej nyias thiab cov nqi xa nyiaj. PECVD coatings kuj muab cov yeeb yaj kiab zoo sib xws, kev ua haujlwm qis, thiab kev ua haujlwm siab.
PECVD tshuab tau dav siv hauv kev lag luam semiconductor rau ntau yam kev siv. Lawv yog siv nyob rau hauv deposition ntawm nyias zaj duab xis rau microelectronic li, photovoltaic hlwb, thiab zaub panels. PECVD txheej yog qhov tseem ceeb tshwj xeeb hauv kev lag luam microelectronics, uas suav nrog thaj chaw xws li tsheb, tub rog, thiab kev tsim khoom lag luam. Cov kev lag luam no siv cov tshuaj dielectric, xws li silicon dioxide thiab silicon nitride, los tsim kev tiv thaiv kev tiv thaiv corrosion thiab av noo.
PECVD cov cuab yeej zoo ib yam li cov khoom siv rau PVD (lub cev vapor deposition) cov txheej txheem, nrog lub chamber, lub tshuab nqus tsev twj (s), thiab cov pa roj. Hybrid systems uas tuaj yeem ua tau ob qho tib si PVD thiab PECVD cov txheej txheem muab qhov zoo tshaj plaws ntawm ob lub ntiaj teb. PECVD txheej txheej zoo li txheej txheej ntawm txhua qhov chaw hauv lub chamber, tsis zoo li PVD, uas yog txoj kab ntawm kev pom. Kev siv thiab kev saib xyuas ntawm PECVD cov cuab yeej yuav txawv nyob ntawm seb qhov kev siv ntawm txhua tus txheej txheem.
PECVD Systems tsim cov txheej txheem li cas?
PECVD yog ib qho kev hloov pauv ntawm cov tshuaj vapor deposition (CVD) uas siv cov ntshav plasma es tsis txhob siv cua sov los ua kom cov pa los yog vapor. Txij li thaum kub siab tuaj yeem zam tau, qhov ntau ntawm cov substrates tau nthuav dav rau cov ntaub ntawv uas tsis tshua muaj melting point - txawm tias plastics hauv qee kis. Ntxiv mus, qhov ntau ntawm cov ntaub ntawv txheej uas tuaj yeem tso tau kuj loj tuaj.
Plasma nyob rau hauv vapor deposition txheej txheem feem ntau yog tsim los ntawm kev siv ib tug voltage rau electrodes embedded nyob rau hauv ib tug roj ntawm tsawg pressures. PECVD tshuab tuaj yeem tsim cov ntshav los ntawm kev sib txawv, piv txwv li, xov tooj cua zaus (RF) mus rau nruab nrab zaus (MF) mus rau lub zog DC los yog ncaj nraim. Qhov twg siv ntau zaus, lub hom phiaj tseem zoo ib yam: lub zog muab los ntawm lub zog hluav taws xob ua kom cov pa roj los yog vapor, tsim cov electrons, ions, thiab nruab nrab radicals.
Cov tsiaj muaj zog no yog thawj zaug rau cov tshuaj tiv thaiv thiab condense ntawm qhov chaw ntawm substrate. Piv txwv li, DLC (pob zeb diamond zoo li cov pa roj carbon monoxide), cov txheej txheem kev ua haujlwm nrov, yog tsim thaum cov pa roj carbon zoo li methane dissociated hauv cov ntshav, thiab carbon thiab hydrogen recombine nyob rau saum npoo ntawm substrate, ua tiav. Sib nrug los ntawm txheej txheej thawj nucleation, nws txoj kev loj hlob tus nqi yog qhov tsis tu ncua, yog li nws cov thickness yog proportional rau lub sij hawm deposition.
Dab tsi yog Txoj Cai Ua Haujlwm ntawm PECVD System?
Plasma tiam
Cov tshuab PECVD siv lub tshuab hluav taws xob RF siab los ua kom muaj cov ntshav qis. Cov khoom siv hluav taws xob no tsim lub ci tawm hauv cov txheej txheem roj, uas ionizes cov roj molecules thiab tsim cov ntshav. Lub plasma muaj ionized roj hom (ions), electrons, thiab qee hom nruab nrab hauv ob qho tib si hauv av thiab lub xeev zoo siab.
Zaj Movie Deposition
Cov zaj duab xis yog muab tso rau ntawm qhov chaw ntawm lub substrate. Lub substrate tuaj yeem ua los ntawm ntau yam ntaub ntawv, suav nrog silicon (Si), silicon dioxide (SiO2), aluminium oxide (Al2O3), npib tsib xee (Ni), thiab stainless hlau. Cov yeeb yaj kiab tuab tuaj yeem tswj tau los ntawm kev kho cov khoom tso tawm xws li cov pa roj av ua ntej, lub zog plasma, thiab lub sijhawm tso nyiaj.
Precursor Gas Activation
Lub precursor gases, uas muaj cov ntsiab lus xav tau rau cov yeeb yaj kiab tso tawm, tau nkag mus rau hauv PECVD chamber. Lub plasma nyob rau hauv lub chamber activates cov precursor gases los ntawm ua inelastic kev sib tsoo ntawm cov electrons thiab roj molecules. Cov kev sib tsoo no ua rau tsim cov kab mob reactive, xws li kev zoo siab nruab nrab thiab dawb radicals, nrog rau ions thiab electrons.
Tshuaj Reactions
Cov activated precursor gases tau dhau los ua cov tshuaj lom neeg hauv cov ntshav. Cov tshuaj tiv thaiv no koom nrog cov hom reactive tsim nyob rau hauv cov kauj ruam dhau los. Cov hom reactive react nrog ib leeg thiab nrog rau lub substrate nto los ua ib tug khoom zaj duab xis. Cov yeeb yaj kiab tso tawm tshwm sim vim muaj kev sib xyaw ntawm cov tshuaj lom neeg thiab cov txheej txheem ntawm lub cev xws li adsorption thiab desorption.
PECVD (Plasma-Enhanced Chemical Vapor Deposition) systems feem ntau ua haujlwm ntawm qhov tsis tshua muaj siab, feem ntau nyob rau hauv thaj tsam ntawm 0.1-10 Torr, thiab ntawm qhov kub thiab txias, feem ntau nyob rau hauv thaj tsam ntawm 200-500 degree. Qhov no txhais tau hais tias PECVD ua haujlwm ntawm lub tshuab nqus tsev siab, vim nws xav tau lub tshuab nqus tsev kim kom tswj tau cov kev kub ntxhov no.
Qhov tsis tshua muaj siab hauv PECVD yuav pab txo qis kev tawg thiab txhawb kev sib luag hauv cov txheej txheem tso nyiaj. Nws kuj txo qhov kev puas tsuaj rau lub substrate thiab tso cai rau kev tso tawm ntawm ntau yam khoom siv.
PECVD systems muaj xws li lub tshuab nqus tsev vacuum, lub tshuab xa roj, lub tshuab hluav taws xob plasma, thiab cov khoom siv substrate. Cov pa roj xa tawm qhia cov roj av ua ntej rau hauv lub tshuab nqus tsev, qhov chaw uas lawv tau qhib los ntawm cov ntshav los ua ib zaj duab xis nyias ntawm lub substrate.
Lub tshuab hluav taws xob plasma hauv PECVD feem ntau siv lub tshuab hluav taws xob ntau zaus RF los tsim lub teeb ci hauv cov txheej txheem roj. Lub plasma ces activates lub precursor gases, txhawb cov tshuaj tiv thaiv uas ua rau tsim ib tug nyias zaj duab xis ntawm lub substrate.
PECVD ua haujlwm ntawm lub tshuab nqus tsev siab, feem ntau nyob rau hauv thaj tsam ntawm 0.1-10 Torr, kom ntseeg tau tias muaj kev sib xws thiab txo qis kev puas tsuaj rau lub substrate thaum lub sij hawm tso nyiaj.
Qhov kub ntawm qhov PECVD yog dab tsi?
Qhov kub ntawm PECVD (Plasma Enhanced Chemical Vapor Deposition) yog ua los ntawm chav tsev kub txog 350 degree. Qhov ntsuas kub qis no yog qhov zoo dua piv rau cov txheej txheem CVD (Chemical Vapor Deposition) cov txheej txheem, uas feem ntau ua rau kub ntawm 600 degree txog 800 degree.
Qhov ntsuas kub qis dua ntawm PECVD tso cai rau kev siv tau zoo nyob rau hauv cov xwm txheej uas qhov kub siab CVD siab dua tuaj yeem ua rau lub cuab yeej puas lossis cov substrate raug coated. Los ntawm kev ua haujlwm ntawm qhov kub thiab txias, nws tsim kom muaj kev ntxhov siab tsawg dua ntawm cov yeeb yaj kiab nyias uas muaj qhov sib txawv thermal expansion/contraction coefficients, uas ua rau muaj kev ua tau zoo ntawm hluav taws xob thiab kev sib txuas rau cov qauv siab.
PECVD yog siv nyob rau hauv nanofabrication rau deposition ntawm nyias films. Nws cov deposition kub yog nyob ntawm 200 mus rau 400 degree. Nws raug xaiv los ntawm lwm cov txheej txheem xws li LPCVD (Low Pressure Chemical Vapor Deposition) lossis thermal oxidation ntawm silicon thaum ua haujlwm kub qis yog qhov tsim nyog vim muaj kev txhawj xeeb txog lub voj voog thermal lossis cov khoom siv txwv. PECVD cov yeeb yaj kiab zoo li yuav muaj ntau dua etch tus nqi, cov ntsiab lus hydrogen ntau dua, thiab cov pinholes, tshwj xeeb tshaj yog rau cov yeeb yaj kiab nyias. Txawm li cas los xij, PECVD tuaj yeem muab cov nqi tso nyiaj ntau dua piv rau LPCVD.
Qhov zoo ntawm PECVD tshaj li cov pa CVD suav nrog qhov ntsuas kub qis dua, kev ua tau zoo thiab cov kauj ruam kev pab cuam ntawm qhov tsis sib xws, nruj dua tswj cov txheej txheem zaj duab xis nyias, thiab cov nyiaj tso tawm siab. PECVD system siv lub plasma los muab lub zog rau kev tso tawm cov tshuaj tiv thaiv, tso cai rau kev ua haujlwm qis dua piv rau cov txheej txheem thermal zoo li LPCVD.
Qhov ntsuas kub ntawm PECVD tso cai rau kev hloov pauv ntau dua hauv cov txheej txheem tso tawm, ua kom muaj kev vam meej hauv ntau qhov xwm txheej uas qhov kub siab dua yuav tsis haum.
Cov ntaub ntawv dab tsi yog tso rau hauv PECVD?
PECVD sawv cev rau Plasma Enhanced Chemical Vapor Deposition. Nws yog cov txheej txheem uas tsis tshua muaj kub tso tawm siv hauv kev lag luam semiconductor los tso cov yeeb yaj kiab nyias ntawm cov substrates. Cov ntaub ntawv uas tuaj yeem tso tau siv PECVD suav nrog silicon oxide, silicon dioxide, silicon nitride, silicon carbide, pob zeb diamond zoo li carbon, poly-silicon, thiab amorphous silicon.
PECVD siv qhov chaw nyob rau hauv CVD reactor nrog ntxiv ntawm cov ntshav, uas yog ib feem ntawm cov roj ionized nrog ib tug siab dawb electron ntsiab lus. Lub plasma yog tsim los ntawm kev siv RF zog rau cov pa roj hauv lub reactor. Lub zog los ntawm cov dawb electrons nyob rau hauv lub plasma dissociates cov reactive gases, ua rau cov tshuaj tiv thaiv uas tso ib zaj duab xis rau saum npoo ntawm lub substrate.
PECVD tuaj yeem ua tau ntawm qhov kub qis, feem ntau ntawm 100 degree thiab 400 degree, vim tias lub zog los ntawm cov electrons dawb hauv cov ntshav dissociates cov roj reactive. Txoj kev ntsuas kub qis no yog tsim rau cov khoom siv kub-rhiab heev.
Cov yeeb yaj kiab tso los ntawm PECVD muaj ntau yam kev siv hauv kev lag luam semiconductor. Lawv yog siv raws li kev sib cais txheej ntawm cov txheej txheem conductive, rau nto passivation, thiab ntaus ntawv encapsulation. PECVD films kuj tseem siv tau los ua encapsulants, passivation khaubncaws sab nraud povtseg, nyuaj lub qhov ncauj qhov ntswg, thiab insulators nyob rau hauv ib tug ntau yam ntawm cov khoom. Tsis tas li ntawd, PECVD cov yeeb yaj kiab yog siv rau hauv cov txheej txheem kho qhov muag, RF lim tuning, thiab ua cov txheej txheem fij hauv MEMS cov khoom siv.
PECVD muaj qhov zoo ntawm kev xa cov yeeb yaj kiab stoichiometric uas muaj kev ntxhov siab tsawg. Cov khoom ua yeeb yaj kiab, xws li stoichiometry, refractive index, thiab kev ntxhov siab, tuaj yeem hloov kho ntau yam nyob ntawm daim ntawv thov. Los ntawm kev ntxiv lwm cov roj reactant, qhov ntau ntawm cov khoom siv hauv cov yeeb yaj kiab tuaj yeem nthuav dav, tso cai rau tso cov yeeb yaj kiab zoo li fluorinated silicon dioxide (SiOF) thiab silicon oxycarbide (SiOC).
PECVD yog cov txheej txheem tseem ceeb hauv kev lag luam semiconductor rau tso cov yeeb yaj kiab nyias nrog kev tswj xyuas meej ntawm thickness, tshuaj muaj pes tsawg leeg, thiab cov khoom. Nws yog dav siv rau deposition ntawm silicon dioxide thiab lwm yam ntaub ntawv nyob rau hauv kub-sensitive pab kiag li lawm.
Qhov txawv ntawm PECVD thiab CVD yog dab tsi?
PECVD (Plasma-enhanced chemical vapor deposition) thiab CVD (Chemical vapor deposition) yog ob txoj kev sib txawv siv los tso cov yeeb yaj kiab nyias mus rau hauv lub substrate. Qhov sib txawv tseem ceeb ntawm PECVD thiab CVD yog nyob rau hauv cov txheej txheem deposition thiab kub siv.
CVD yog txheej txheem uas tso siab rau ntawm qhov chaw kub kom muaj kev cuam tshuam cov tshuaj mus rau lossis ib puag ncig cov substrate. Nws siv qhov kub thiab txias dua piv rau PECVD. CVD cuam tshuam cov tshuaj tiv thaiv ntawm precursor gases nyob rau saum npoo ntawm lub substrate, ua rau cov deposition ntawm nyias zaj duab xis. Lub deposition ntawm CVD txheej tshwm sim nyob rau hauv ib tug ntws gaseous xeev, uas yog ib tug diffuse multidirectional hom deposition. Nws cuam tshuam cov tshuaj tiv thaiv ntawm cov roj av ua ntej thiab cov substrate nto.
Ntawm qhov tod tes, PECVD siv cov plasma txias los tso cov khaubncaws sab nraud povtseg rau saum npoo. Nws siv qhov ntsuas kub qis heev piv rau CVD. PECVD suav nrog kev siv cov ntshav plasma, uas yog tsim los ntawm kev siv cov hluav taws xob ntau zaus rau cov pa roj, feem ntau yog sib xyaw ntawm cov roj av ua ntej. Lub plasma activates lub precursor gases, tso cai rau lawv hnov mob thiab tso raws li ib tug nyias zaj duab xis mus rau lub substrate. Lub deposition ntawm PECVD txheej tshwm sim los ntawm ib tug kab-ntawm-qhov chaw deposition, raws li cov activated precursor gases yog coj mus rau lub substrate.
Cov txiaj ntsig ntawm kev siv PECVD txheej muaj xws li qhov kub thiab txias, uas txo cov kev ntxhov siab ntawm cov khoom siv coated. Qhov ntsuas kub qis no tso cai rau kev tswj xyuas zoo dua ntawm txheej txheej txheej txheej nyias nyias thiab cov nqi tso nyiaj. PECVD coatings kuj muaj ntau yam kev siv, suav nrog cov khaubncaws sab nraud povtseg hauv optics.
PECVD thiab CVD yog cov txheej txheem sib txawv rau kev tso cov yeeb yaj kiab nyias. CVD cia siab rau qhov chaw kub thiab tshuaj lom neeg, thaum PECVD siv cov plasma txias thiab qis dua rau kev tso tawm. Kev xaiv ntawm PECVD thiab CVD yog nyob ntawm daim ntawv thov tshwj xeeb thiab cov khoom xav tau ntawm txheej txheej.
Kev ua haujlwm ntawm PECVD Systems
Tshuaj vapor deposition (CVD) yog ib tug txheej txheem nyob rau hauv uas cov roj sib tov reacts los tsim ib tug khoom khoom uas yog deposited raws li ib tug txheej ntawm ib tug substrate. Hom txheej txheej uas tuaj yeem tau txais los ntawm CVD muaj ntau yam: insulating, semi conductive, conductive, lossis super conductive coatings; hydrophilic lossis hydrophobic txheej, ferroelectric lossis ferromagnetic txheej; coatings resistant rau tshav kub, hnav, corrosion los yog khawb; photosensitive khaubncaws sab nraud povtseg, thiab lwm yam. Cov txheej txheem sib txawv tau tsim los nqa tawm CVD, uas txawv ntawm qhov kev ua haujlwm ntawm cov tshuaj tiv thaiv. Nyob rau hauv dav dav, CVD nyob rau hauv tag nrho nws cov ntaub ntawv ua tiav heev homogeneous nto txheej, tshwj xeeb tshaj yog pab tau rau peb-dimensional qhov chaw, txawm nrog interstices los yog irregular nto nyuaj rau nkag tau. Txawm li cas los xij, plasma-enhanced chemical vapor deposition (PECVD) muaj qhov zoo dua ntxiv ntawm thermally activated CVD vim nws tuaj yeem ua haujlwm ntawm qhov kub thiab txias.
Ib txoj hauv kev zoo heev ntawm kev siv cov plasma coatings yog muab cov khoom ua haujlwm tso rau hauv lub tshuab nqus tsev ntawm lub tshuab PECVD qhov twg lub siab raug txo kom txog li ntawm {{0}}}.1 thiab 0.5 millibars. Cov roj ntws tau nkag mus rau hauv lub chamber kom tso rau ntawm qhov chaw thiab hluav taws xob poob siab yog siv los ua kom cov atoms lossis molecules ntawm cov roj sib tov. Qhov tshwm sim yog plasma uas nws cov khoom muaj ntau dua reactive dua li lub xeev gaseous, uas tso cai rau cov kev tshwm sim tshwm sim ntawm qhov kub thiab txias (nruab nrab ntawm 100 thiab 400 degree), nce tus nqi deposition, thiab nyob rau hauv tej rooj plaub txawm nce efficiency ntawm tej yam kev xav. Cov txheej txheem txuas ntxiv mus rau hauv PECVD system kom txog thaum txheej txheej mus txog qhov xav tau tuab, thiab cov khoom siv los ntawm cov tshuaj tiv thaiv tau muab rho tawm los txhim kho cov purity ntawm txheej.
Peb Cov Ntawv Pov Thawj
Peb lub Hoobkas
Xinkyo Company tau tsim nyob rau hauv 2005 los ntawm cov kws tshawb fawb cov ntaub ntawv. Nws tus tsim tau kawm hauv Peking University thiab yog lub chaw tsim khoom ntawm cov cuab yeej siv ntsuas kub siab thiab cov ntaub ntawv tshiab tshawb fawb cov cuab yeej kuaj. Qhov no ua rau peb muab cov khoom siv zoo, tsis tshua muaj nqi siab rau cov ntaub ntawv tshawb fawb thiab kev tsim kho cov chaw soj nstuam. Peb cov khoom muaj xws li cov qhov cub kub kub, lub raj cua sov, lub tshuab nqus tsev vacuum, trolley furnaces, lifting furnaces, thiab lwm yam khoom tiav. Ua tsaug rau nws cov qauv tsim zoo heev, tus nqi pheej yig, thiab kev pabcuam rau cov neeg siv khoom, Xinkyo tau cog lus los ua tus thawj coj hauv ntiaj teb hauv cov ntaub ntawv tshawb fawb txog cov khoom siv kub.
Qhov kawg FAQ Qhia rau PECVD System
Raws li ib qho ntawm cov ua pecvd system manufacturers thiab lwm tus neeg nyob hauv Suav teb, peb sov siab txais tos koj mus yuav cov qib siab pecvd system rau muag ntawm no los ntawm peb lub hoobkas. Tag nrho peb cov khoom yog nrog cov khoom zoo thiab cov nqi sib tw.